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Proceedings Paper

PLD of hard ceramic coatings
Author(s): Yibran Perera; Jens Gottmann; Andreas Husmann; Thomas Klotzbuecher; Ernst-Wolfgang Kreutz; Reinhart Poprawe
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Paper Abstract

The deposition of different hard ceramics coatings as Al2O3, ZrO2, c-BN and DLC thin films by pulsed laser deposition (PLD) has been of increasing interest as alternative process compared to the latest progress in CVD and PVD deposition. For instance, in pulsed laser deposition, the properties of the resulting thin films are influenced by the composition, ionization state, density, kinetic and excitation energies of the particles of the vapor/plasma. In order to deposit hard ceramics with different properties and applications, various substrates as Pt/Ti/Si multilayer, glass (fused silica), steel, polymethylmethacrylate (PMMA), polycarbonate (PC), Si(100) and Si(111) are used. These thin films are deposited either by excimer laser radiation ((lambda) equals 248 nm) or by CO2 laser radiation ((lambda) equals 10.6 micrometers ). To characterize the structural, optical and mechanical properties of the hard ceramics thin films, different techniques as Raman spectroscopy, ellipsometry, FTIR spectroscopy and nanoindentation are used.

Paper Details

Date Published: 29 June 2001
PDF: 12 pages
Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432550
Show Author Affiliations
Yibran Perera, RWTH Aachen (Germany)
Jens Gottmann, RWTH Aachen and Univ. Siegen (Germany)
Andreas Husmann, RWTH Aachen and ORGA Kartensysteme GmbH (Germany)
Thomas Klotzbuecher, RWTH Aachen and Institut fuer Mikrotechnik Mainz (Germany)
Ernst-Wolfgang Kreutz, RWTH Aachen (Germany)
Reinhart Poprawe, RWTH Aachen and Fraunhofer-Institut fuer Lasertechnik (Germany)

Published in SPIE Proceedings Vol. 4274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VI
Malcolm C. Gower; Henry Helvajian; Koji Sugioka; Jan J. Dubowski, Editor(s)

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