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Proceedings Paper

Comparison of tin oxide chemical sensors prepared by PLD and laser-assisted CVD methods
Author(s): Jan Lancok; Miroslav Jelinek; Filip Vyslouzil; Martin Vrnata; Vladimir Myslik; Antonino Santoni; Ivano Menucucci
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Paper Abstract

Tin oxide active layers were deposited by Pulsed Laser Deposition (PLD) and Laser assisted Chemical Vapor Deposition (LCVD) methods. The films were grown on the same substrate chips for the thin layer conductive sensor. Their chemical and morphological properties were studied in connection with gas sensor applications. The influence of the Pd catalyst was tested. The chemical composition was investigated by XPS analysis. A sensitivity to 1000 ppm of hydrogen of about 1090 for PLD and 5 for LCVD was achieved.

Paper Details

Date Published: 29 June 2001
PDF: 4 pages
Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432542
Show Author Affiliations
Jan Lancok, Institute of Physics (Czech Republic)
Miroslav Jelinek, Institute of Physics (Czech Republic)
Filip Vyslouzil, Institute of Chemical Technology (Czech Republic)
Martin Vrnata, Institute of Chemical Technology (Czech Republic)
Vladimir Myslik, Institute of Chemical Technology (Czech Republic)
Antonino Santoni, ENEA (Italy)
Ivano Menucucci, ENEA (Italy)


Published in SPIE Proceedings Vol. 4274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VI
Malcolm C. Gower; Henry Helvajian; Koji Sugioka; Jan J. Dubowski, Editor(s)

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