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Proceedings Paper

Comparison of microstructuring irradiated by 193-nm and 308-nm lasers
Author(s): Lin Zhang; Qihong Lou; Yunrong Wei; Jingxing Dong
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Paper Abstract

In this paper, the direct ablation of polymer films of PMMA, PI, PC and K9 glass has been studied at wavelengths of 193 nm and 308 nm. The ablation characteristics of microstructuring is mainly discussed and compared. The ablation qualities of PC, PMMA and K9 glass by XeCl (308 nm, 30 ns) excimer laser are very poor. The ablation performances of PMMA and K9 glass by ArF (193 nm, 17 ns) excimer laser are medium. Smooth surfaces and sharp edges with micron transverse resolution and submicron depth precision can be obtained by the ablation of PI at 308 nm, and PI, PC at 193 nm.

Paper Details

Date Published: 29 June 2001
PDF: 4 pages
Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432541
Show Author Affiliations
Lin Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Qihong Lou, Shanghai Institute of Optics and Fine Mechanics (China)
Yunrong Wei, Shanghai Institute of Optics and Fine Mechanics (China)
Jingxing Dong, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 4274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VI
Malcolm C. Gower; Henry Helvajian; Koji Sugioka; Jan J. Dubowski, Editor(s)

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