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Proceedings Paper

Diamond-based deep-UV sensors for lithography applications
Author(s): Michael D. Whitfield; Stuart P. Lansley; Olivier Gaudin; Robert D. McKeag; Nadeem Hasan Rizvi; Richard B. Jackman
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Paper Abstract

Next generation photolithography stepper tools will operate at 157 nm and require robust solid state photodetectors to ensure efficient operation and facilitate direct beam monitoring for photoresist dosimetry. There is currently no commercial detector system able to fully meet all the demanding requirements of this application. Diamond has a band gap of 5.5 eV. This implies that detectors fabricated from this material may be intrinsically visible blind and radiation hard. In this paper the results of the first study to assess the viability of the use of thin film polycrystalline diamond photodetectors for use in 157 nm F2-He based laser lithography tools are presented. Co- planar interdigitated electrode structures were fabricated on free standing polycrystalline diamond to realise photoconductive devices. These were exposed to pulses from an F2-He laser in the fluence range 0 - 1.4 mJcm-2. The electrical and optical characteristics of the devices have been measured and are compared to the response of a standard vacuum photodiode. The diamond devices appear to be ideally suited for use at 157 nm in lithography applications.

Paper Details

Date Published: 29 June 2001
PDF: 8 pages
Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432534
Show Author Affiliations
Michael D. Whitfield, Exitech Ltd. (United Kingdom)
Stuart P. Lansley, Univ. College London (United Kingdom)
Olivier Gaudin, Univ. College London (United Kingdom)
Robert D. McKeag, Centronic Ltd. (United Kingdom)
Nadeem Hasan Rizvi, Exitech Ltd. (United Kingdom)
Richard B. Jackman, Univ. College London (United Kingdom)


Published in SPIE Proceedings Vol. 4274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VI
Malcolm C. Gower; Henry Helvajian; Koji Sugioka; Jan J. Dubowski, Editor(s)

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