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Proceedings Paper

High-intensity laser processing of thin films
Author(s): Vladislav V. Yakovlev; J. Magyar; C. Aita; A. Sklyarov; Katerina Mikhailichenko
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Paper Abstract

We use high intensity nanosecond laser pulses of different wavelengths to modify thin film coatings (silica and titania) on the surface of silicon. We find that films as thick as 1 micron can be removed from the surface in one shot with minor or no damage to the Si surface. We also find the accumulated effect of multiple pulse irradiation. Finally we report our preliminary results on phase transformations in titania films induced by high intensity laser.

Paper Details

Date Published: 29 June 2001
PDF: 10 pages
Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432520
Show Author Affiliations
Vladislav V. Yakovlev, Univ. of Wisconsin/Milwaukee (United States)
J. Magyar, Univ. of Wisconsin/Milwaukee (United States)
C. Aita, Univ. of Wisconsin/Milwaukee (United States)
A. Sklyarov, Univ. of Wisconsin/Milwaukee (United States)
Katerina Mikhailichenko, Lam Research Corp. (United States)


Published in SPIE Proceedings Vol. 4274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VI
Malcolm C. Gower; Henry Helvajian; Koji Sugioka; Jan J. Dubowski, Editor(s)

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