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Proceedings Paper

Laser ablation of solid nitrogen films at a cryogenic temperature
Author(s): Hiroyuki Niino; Tadatake Sato; Akira Yabe
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Paper Abstract

Photo-dissociation and laser ablation of solid nitrogen film at 10 K was carried out upon irradiation with a picosecond UV laser (FHG of Nd:YLF laser; 263 nm, 8 ps, 10 Hz) in vacuum. The optical emission lines, attributed to molecular and atomic nitrogen of the film, were monitored by a time-resolved spectroscopic technique. The mechanism of these processes was discussed on the basis of multi-photon absorption of molecular nitrogen.

Paper Details

Date Published: 29 June 2001
PDF: 8 pages
Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432513
Show Author Affiliations
Hiroyuki Niino, National Institute of Materials and Chemical Research (Japan)
Tadatake Sato, National Institute of Materials and Chemical Research (Japan)
Akira Yabe, National Institute of Materials and Chemical Research (Japan)


Published in SPIE Proceedings Vol. 4274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VI
Malcolm C. Gower; Henry Helvajian; Koji Sugioka; Jan J. Dubowski, Editor(s)

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