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Proceedings Paper

157-nm laser-induced modification of fused-silica glasses
Author(s): Jie Zhang; Peter R. Herman; Christian Lauer; Kevin P. Chen; Xiaoli Midori Wei
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Paper Abstract

Bulk laser modification is reported for hydroxyl (OH), chlorine (Cl) and fluorine (F) containing fused-silica glasses irradiated with 157-nm F2-laser light. We detail the effects of OH, Cl and F concentration, as well as hydrogen (H2) loading, on compaction, refractive-index change, and color-center formation. Volume gratings formed with several tens of kJ/cm2 fluence yielded surface-relief gratings of several tens of nm amplitude and bulk refractive-index changes of nearly 10-3 in both OH- and Cl-content glasses that were pre-soaked in high-pressure hydrogen. H2-loading offered an approximate 2-fold increase in 157-nm glass photosensitivity, and also increased the 157-nm material absorption by several factors during the exposure. In contrast, F-doped glass did not offer a measurable 157-nm photosensitivity, and the 157-nm absorption showed a surprising order-of-magnitude drop following an approximate 10-kJ/cm2 laser dose.

Paper Details

Date Published: 29 June 2001
PDF: 8 pages
Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432504
Show Author Affiliations
Jie Zhang, Univ. of Toronto (Canada)
Peter R. Herman, Univ. of Toronto (Canada)
Christian Lauer, Univ. of Toronto (Canada)
Kevin P. Chen, Univ. of Toronto (Canada)
Xiaoli Midori Wei, Univ. of Toronto (Canada)


Published in SPIE Proceedings Vol. 4274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VI
Malcolm C. Gower; Henry Helvajian; Koji Sugioka; Jan J. Dubowski, Editor(s)

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