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Proceedings Paper

New mechanism of laser dry cleaning
Author(s): Boris S. Luk'yanchuk; Yuan Wei Zheng; Yongfeng Lu
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Paper Abstract

The dry laser cleaning arises due to thermal expansion of the substrate and/or particle, when the corresponding acceleration force produces work sufficient to overcome the adhesion energy. The previous examinations of the dry cleaning were done for two mechanisms: 1) expansion of absorbing particle on the transparent substrate and 2) expansion of the absorbing substrate with non-absorbing particle. Nevertheless using model with conventional mechanism based on the 1D surface expansion, one can find threshold fluence by the order of magnitude higher than experimental one. In the present paper, we discuss the new mechanism for situation when the particle is heated due to thermal contact with substrate, and additional thermo deformation effect, caused by optical enhancement. It is shown that these effects can be responsible for relatively small threshold fluence for laser cleaning of SiO2 particles from the surface of Si by ns-excimer laser pulse.

Paper Details

Date Published: 26 June 2001
PDF: 12 pages
Proc. SPIE 4423, Nonresonant Laser-Matter Interaction (NLMI-10), (26 June 2001); doi: 10.1117/12.431213
Show Author Affiliations
Boris S. Luk'yanchuk, National Univ. of Singapore (Singapore)
Yuan Wei Zheng, National Univ. of Singapore (Singapore)
Yongfeng Lu, National Univ. of Singapore (United States)

Published in SPIE Proceedings Vol. 4423:
Nonresonant Laser-Matter Interaction (NLMI-10)
Mikhail N. Libenson, Editor(s)

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