Share Email Print

Proceedings Paper

Nanolithography on silicon surface using a tuning fork STM/AFM
Author(s): S. Y. Lin; C. C. Fan; D. P. Tsai; F. S.S. Chien; S. Gwo; Wen-Feng Hsieh
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A tapping mode atomic force microscopy (AFM)/scanning tunneling microscopy (STM) system using a non-optical tuning fork force sensing method has been developed for the scanning probe lithography. In comparisons with the nanolithography done by AFM with the conductive cantilever tip, our method has the following advantages. (1) It has longer tapered length STM tip and smaller half cone angle to perform the nanometer scale patterning with high aspect ratio. (2) Its low cost tungsten or Pt/Ir STM tip can be easily fabricated and attached to our AFM force sensing tuning fork. (3) It can be easily adapted to large-scale parallel processing because of the all-electric force sensing methods. Nanostructures with high aspect ratios and large depths have been successfully performed on the silicon surface by using our AFM/STM nanopatterning system followed by the differential etching process. Lines with different widths and matrices of dots with various diameters were demonstrated for potential applications.

Paper Details

Date Published: 8 May 2001
PDF: 6 pages
Proc. SPIE 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001), (8 May 2001); doi: 10.1117/12.427084
Show Author Affiliations
S. Y. Lin, National Taiwan Univ. (Taiwan)
C. C. Fan, National Taiwan Univ. (Taiwan)
D. P. Tsai, National Taiwan Univ. (Taiwan)
F. S.S. Chien, National Chaio-Tung Univ. (Taiwan)
S. Gwo, National Tsing-Hua Univ. (Taiwan)
Wen-Feng Hsieh, National Chiao-Tung Univ. (Taiwan)

Published in SPIE Proceedings Vol. 4416:
Optical Engineering for Sensing and Nanotechnology (ICOSN 2001)
Koichi Iwata, Editor(s)

© SPIE. Terms of Use
Back to Top