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Proceedings Paper

In-situ single-wavelength ellipsometer for a vacuum chamber
Author(s): Won Chegal; Sangheon Ye; Hyun-Mo Cho; Yoonwoo Lee; Soo Hyun Kim; Yoon Keun Kwak
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Paper Abstract

We have developed an in-situ single wavelength ellipsometer applicable to a vacuum sputter to monitor ellipsometric parameters during thin film deposition. The translation and tilting stages in the polarizer and analyzer make it easy to adjust optical axis and the angle of incidence. To calibrate inherent offset in the azimuth axis of the polarizer and analyzer, regression and residual calibration procedures are conducted. This work also includes the measurement results of the silver target deposition on the alloy, made of chrome and nickel, and silicon wafers. The manufactured ellipsometer will be used to investigate optical properties of the thin film and substrate in the vacuum state with various temperature ranges.

Paper Details

Date Published: 8 May 2001
PDF: 4 pages
Proc. SPIE 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001), (8 May 2001); doi: 10.1117/12.426993
Show Author Affiliations
Won Chegal, Korea Advanced Institute of Science and Technology (South Korea)
Sangheon Ye, Korea Advanced Institute of Science and Technology (South Korea)
Hyun-Mo Cho, Korea Research Institute of Standards and Science (South Korea)
Yoonwoo Lee, Korea Research Institute of Standards and Science (South Korea)
Soo Hyun Kim, Korea Advanced Institute of Science and Technology (South Korea)
Yoon Keun Kwak, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 4416:
Optical Engineering for Sensing and Nanotechnology (ICOSN 2001)
Koichi Iwata, Editor(s)

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