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Proceedings Paper

Photorefractive phase mask
Author(s): Haidong Wen; Simin Liu; Xinzheng Zhang; Ru Guo; Guoquan Zhang; Qian Sun; Jingjun Xu; Guangyin Zhang
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Paper Abstract

We propose and demonstrate a new method to fabricate volume phase mask in LiNbO3:Fe crystal by photorefractive effect, for the first time to our knowledge. First, we image an amplitude mask with corresponding intensity distribution at the incident face of a photorefractive LiNbO3:Fe crystal. After an exposure of proper time, due to photorefractive effect, the distribution of refractive index in the crystal is changed. Therefore we get the volume phase mask we want. The influence of the anisotropy of photorefractive nonlinearity on volume phase mask can be overcome by controlling experimental conditions. We can see an intensity-modulation image in the image plane of the volume phase mask. The intensity distribution of the image of the volume phase mask is inverse from the one of input amplitude mask. It can be explained by waveguide theory. Volume phase mask can be used to get modulated amplitude pattern by modulating the phase of incident light. It has the advantage of low energy loss over amplitude mask and real-time. Our method is very simple. It can be used to fabricate many kinds of complex phase masks and phase components used in optical information processing and Integrated Optics.

Paper Details

Date Published: 15 May 2001
PDF: 8 pages
Proc. SPIE 4277, Integrated Optics Devices V, (15 May 2001); doi: 10.1117/12.426808
Show Author Affiliations
Haidong Wen, Nankai Univ. (China)
Simin Liu, Nankai Univ. (China)
Xinzheng Zhang, Nankai Univ. (China)
Ru Guo, Nankai Univ. (China)
Guoquan Zhang, Nankai Univ. (China)
Qian Sun, Nankai Univ. (China)
Jingjun Xu, Nankai Univ. (China)
Guangyin Zhang, Nankai Univ. (China)


Published in SPIE Proceedings Vol. 4277:
Integrated Optics Devices V
Giancarlo C. Righini; Seppo Honkanen, Editor(s)

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