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Proceedings Paper

Development of x-ray photoelectron microscopic system with a compact x-ray source
Author(s): Chiemi Fujikawa; Naohiro Yamaguchi; Tadayuki Ohchi; Tamio T. Hara; Katsumi Watanabe; Ibuki Tanaka; Masami Taguchi
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Paper Abstract

We have constructed an x-ray photoelectron microscopic system with x-rays form laser-produced plasma as a source. X-rays involving amplified spontaneous emissions at 15.47 nm were collected by a Schwarzschild mirror coated with Mo/Si multilayers for 15.47 nm x-ray. As preliminary results, Ga 3d and As 3d electrons emitted form a GaAs wafer were observed in the photoelectron spectrum taken by 1 min accumulation.

Paper Details

Date Published: 23 April 2001
PDF: 4 pages
Proc. SPIE 4424, ECLIM 2000: 26th European Conference on Laser Interaction with Matter, (23 April 2001); doi: 10.1117/12.425648
Show Author Affiliations
Chiemi Fujikawa, Toyota Technological Institute (Japan)
Naohiro Yamaguchi, Toyota Technological Institute (Japan)
Tadayuki Ohchi, National Institute of Materials and Chemical Research (Japan)
Tamio T. Hara, Toyota Technological Institute (Japan)
Katsumi Watanabe, ULVAC-PHI Inc. (Japan)
Ibuki Tanaka, ULVAC-PHI Inc. (Japan)
Masami Taguchi, ULVAC-PHI Inc. (Japan)


Published in SPIE Proceedings Vol. 4424:
ECLIM 2000: 26th European Conference on Laser Interaction with Matter
Milan Kalal; Karel Rohlena; Milan Sinor, Editor(s)

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