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Proceedings Paper

Enhancement of the electrophotographic sensitivity of amorphous selenium films using a PVK polymer barrier layer
Author(s): S. Chand; G. D. Sharma; S. Dwivedi; A. Agarwal; E. S. R. Gopal
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Paper Abstract

X-ray sensitivity of amorphous selenium (a-Se films approximately 130 micrometers ) has been studied as a function of thickness (approximately 2400A to 7500A) of polyvinyl carbazole (PVK) interface barrier layer using the potential decay technique. The films show maximum sensitivity when incorporated with barrier layer of thickness approximately 7500A. This has been attributed to the blocking, trapping and field enhanced mobility role of the PVK interface barrier layer.

Paper Details

Date Published: 17 April 2001
PDF: 5 pages
Proc. SPIE 4413, International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology, (17 April 2001); doi: 10.1117/12.425456
Show Author Affiliations
S. Chand, National Physical Lab. (India)
G. D. Sharma, National Physical Lab. (India)
S. Dwivedi, National Physical Lab. (India)
A. Agarwal, National Physical Lab. (India)
E. S. R. Gopal, Indian Institute of Science (India)


Published in SPIE Proceedings Vol. 4413:
International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology
Jaroslaw Rutkowski; Jakub Wenus; Leszek Kubiak, Editor(s)

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