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Proceedings Paper

Visible photoluminescence from Ge+-ion-implanted SiOxNy annealed under hydrostatic pressure
Author(s): Ida E. Tyschenko; K. S. Zhuravlev; E. N. Vandyshev; Andrzej Misiuk; Rossen A. Yankov; Lars Rebohle; Wolfgang Skorupa
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Paper Abstract

New experiments are reported which explore the influence of the hydrostatic pressure during post-implantation annealing on the photoluminescence (PL) from silicon oxynitride layers (SiOxNy, x=0.25, y=1) implanted with Ge+ ions. It is shown that the use of a hydrostatic pressure during heat treatment results in an enhancement of the PL intensity by an order of magnitude compared with that arising from anneals carried out at atmospheric pressure. The observed increase in the PL intensity is explained in terms of the enhanced formation of radiative recombination canters within meta-stable regions of the implanted silicon oxynitride. The nature of these centers is believed to be associated with the equalsVSi-SiequalsV) center and defect complexes incorporating Ge atoms (e.g. equalsVSi-GeequalsV) or equalsVGe-GeequalsV) centers).

Paper Details

Date Published: 17 April 2001
PDF: 5 pages
Proc. SPIE 4413, International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology, (17 April 2001); doi: 10.1117/12.425438
Show Author Affiliations
Ida E. Tyschenko, Institute of Semiconductor Physics (Germany)
K. S. Zhuravlev, Institute of Semiconductor Physics (Russia)
E. N. Vandyshev, Institute of Semiconductor Physics (Russia)
Andrzej Misiuk, Institute of Electron Technology (Poland)
Rossen A. Yankov, CCR GmbH (United States)
Lars Rebohle, Forschungszentrum Rossendorf e.V. (Germany)
Wolfgang Skorupa, Forschungszentrum Rossendorf e.V. (Germany)


Published in SPIE Proceedings Vol. 4413:
International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology
Jaroslaw Rutkowski; Jakub Wenus; Leszek Kubiak, Editor(s)

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