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Proceedings Paper

In-situ STM study of copper deposition on Cu(111) single-crystal electrode in sulfuric acid solution
Author(s): Wanda Polewska; M. R. Vogt; O. M. Magnussen; R. J. Behm
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Paper Abstract

Results of an in-situ STM study of homoepitaxial copper electro deposition on Cu(111) in 0.01 M H2SO4 solution are presented which show a pronounced change in the growth and morphology of the deposit with increasing potential: while at - 0.40 V vs. SCE Cu multilayer growth is observed, Cu grows via a step-flow mechanism at -0.55 V. This behavior can be explained by the presence of an ordered sulfate adlayer at potentials >=-o.42 V, which causes a pronounced decrease in the Cu surface mobility.

Paper Details

Date Published: 17 April 2001
PDF: 4 pages
Proc. SPIE 4413, International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology, (17 April 2001); doi: 10.1117/12.425437
Show Author Affiliations
Wanda Polewska, Poznan Univ. of Technology (Poland)
M. R. Vogt, Univ. Ulm (Germany)
O. M. Magnussen, Univ. Ulm (Germany)
R. J. Behm, Univ. Ulm (Germany)


Published in SPIE Proceedings Vol. 4413:
International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology
Jaroslaw Rutkowski; Jakub Wenus; Leszek Kubiak, Editor(s)

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