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Proceedings Paper

Strain in epitaxial laterally overgrown (ELO) structures
Author(s): Zbigniew R. Zytkiewicz
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Paper Abstract

X-ray diffraction and synchrotron x-ray topography methods were used to analyze strain in GaAs layers grown on GaAs and Si substrates by epitaxial lateral overgrowth (ELO) from a liquid phase. We show the laterally overgrown parts of ELO stripes adhere to the SiO2 mask which results in their downwards bending. The procedure was found which allows to control adhesion of the layers to the mask by adjusting the vertical growth rate of the layers. For the case of GaAs ELO layers grown on Si substrates the ELO stripes bend outwards from the mask due to the tensile strain in the GaAs buffer layer. Recent data published on strain in other than GaAs ELO structures are reviewed and compared with our results.

Paper Details

Date Published: 17 April 2001
PDF: 8 pages
Proc. SPIE 4413, International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology, (17 April 2001); doi: 10.1117/12.425413
Show Author Affiliations
Zbigniew R. Zytkiewicz, Institute of Physics (Poland)


Published in SPIE Proceedings Vol. 4413:
International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology
Jaroslaw Rutkowski; Jakub Wenus; Leszek Kubiak, Editor(s)

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