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Proceedings Paper

In-line inspection method with AIT-II and ADC
Author(s): Kathleen Terryll; Carlos Mateos
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Paper Abstract

In this article, we emphasize the streamlined, in-line inspection methodology at Agere Systems, Madrid, Spain (formally Lucent Technologies, Microelectronics). This method includes the use of AIT-II with Impact ADC 2.0 to better focus and separate out excursion and baseline events. Real life examples demonstrating the potential of ADC are presented. In continuation, the shop reaction methodology and data flow scheme is described in detail. Currently, the Agere systems methodology is one of the most advanced in the European semiconductor industry.

Paper Details

Date Published: 23 April 2001
PDF: 9 pages
Proc. SPIE 4406, In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing II, (23 April 2001); doi: 10.1117/12.425284
Show Author Affiliations
Kathleen Terryll, Agere Systems (Spain)
Carlos Mateos, Agere Systems (Spain)


Published in SPIE Proceedings Vol. 4406:
In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing II
Gudrun Kissinger; Larg H. Weiland, Editor(s)

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