Share Email Print
cover

Proceedings Paper

Some measurements on the effects of developer depletion
Author(s): Brian Martin; Tom Tighe
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

This work describes assessment of `long range' and `short range' developer depletion using production and test reticles respectively. Long range developer depletion refers to the case where development of large unpatterned field areas remote from critical dimensions influences their size, whether the field areas are exposed or unexposed. Results show no significant effect at the 0.35 micron scale. Short range developer depletion refers to the case, on test reticles, where single lines are defined in large open field areas or in a small open box set within a dark field area. Differences in CD's can be readily measured on test reticles and attributed to the effects of developer depletion.

Paper Details

Date Published: 20 April 2001
PDF: 6 pages
Proc. SPIE 4405, Process and Equipment Control in Microelectronic Manufacturing II, (20 April 2001); doi: 10.1117/12.425249
Show Author Affiliations
Brian Martin, Mitel Semiconductor (United Kingdom)
Tom Tighe, Mitel Semiconductor (United Kingdom)


Published in SPIE Proceedings Vol. 4405:
Process and Equipment Control in Microelectronic Manufacturing II
Martin Fallon, Editor(s)

© SPIE. Terms of Use
Back to Top