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Proceedings Paper

Stepper lens field critical dimension uniformity and optical proximity correction
Author(s): Brian Martin
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Paper Abstract

Rule tables for describing optical proximity correction can be derived either from practical measurements or by means of lithography simulation. This paper shows that one set of rules may not adequately apply across the whole of the image field depending on CD uniformity across the lens field. Example measurements illustrate the problem and proposals are made for its solution.

Paper Details

Date Published: 20 April 2001
PDF: 5 pages
Proc. SPIE 4405, Process and Equipment Control in Microelectronic Manufacturing II, (20 April 2001); doi: 10.1117/12.425244
Show Author Affiliations
Brian Martin, Mitel Semiconductor (United Kingdom)


Published in SPIE Proceedings Vol. 4405:
Process and Equipment Control in Microelectronic Manufacturing II
Martin Fallon, Editor(s)

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