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Proceedings Paper

Simulation-enabled decision making in advanced lithographic manufacturing
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Paper Abstract

Spatial modeling methods to improve manufacturing implementation and evaluate process capability are described. The basic elements of the simulation environment are developed and applied to answer real world manufacturing questions on process transfer risks, exposure system quality and paths to improving manufacturing performance. The hidden value in process and tool characterization data is leveraged through predictive modeling techniques and the eventual ink of advanced modeling to process control on the manufacturing line is anticipated. This paper is written in survey fashion offering examples, suggestions and references for those interested in developing or improving a simulation infrastructure for lithographic manufacturing.

Paper Details

Date Published: 26 April 2001
PDF: 12 pages
Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425236
Show Author Affiliations
Christopher J. Progler, IBM Semiconductor Research and Development Ctr. (United States)


Published in SPIE Proceedings Vol. 4404:
Lithography for Semiconductor Manufacturing II
Chris A. Mack; Tom Stevenson, Editor(s)

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