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Proceedings Paper

Microstructuring irradiated by 197- and 308-nm excimer laser
Author(s): Qihong Lou; Lin Zhang
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Paper Abstract

In this paper, the direct ablation of polymer films of PMMA, PI, PC and K9 glass has been studied at wavelength of 193nm and 308nm. The ablation characteristics of microstructuring is mainly discussed and compared. The ablation qualities of PC, PMMA and K9 glass by ArF excimer laser are medium. Smooth surfaces and sharp edges with micron transverse resolution and submicron dep precision can be obtained by the ablation of PI at 308nm, and PI, PC at 193nm.

Paper Details

Date Published: 26 April 2001
PDF: 4 pages
Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425224
Show Author Affiliations
Qihong Lou, Shanghai Institute of Optics and Fine Mechanics (China)
Lin Zhang, Shanghai Institute of Optics and Fine Mechanics (China)

Published in SPIE Proceedings Vol. 4404:
Lithography for Semiconductor Manufacturing II
Chris A. Mack; Tom Stevenson, Editor(s)

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