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Proceedings Paper

Final inspection of photomask blanks
Author(s): Fredi Schubert; Hartmut Sauerbrei; Lutz Aschke; Konrad Knapp
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Paper Abstract

In order to increase the quality in manufacturing of future photon mask generations Schott Lithotec is brought in a brand new, much increased automatic laser inspection system into a new manufacturing line of photo mask blanks. It is in a position to detect additionally to the standard defect types further defect types like dim- and bright-chrome defects. The resolution of the system is less than 100 nm. With a quickly inspecting time per blank of less than three minutes and for the first time in the world used automatic SMIF-pod-handling this is a tool for the 100 percent final inspection in the manufacturing of photo mask blanks.

Paper Details

Date Published: 26 April 2001
PDF: 8 pages
Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425223
Show Author Affiliations
Fredi Schubert, Schott Lithotec AG (Germany)
Hartmut Sauerbrei, Schott Lithotec AG (Germany)
Lutz Aschke, Schott Lithotec AG (Germany)
Konrad Knapp, Schott Lithotec AG (Germany)


Published in SPIE Proceedings Vol. 4404:
Lithography for Semiconductor Manufacturing II
Chris A. Mack; Tom Stevenson, Editor(s)

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