Share Email Print
cover

Proceedings Paper

Electron projection lithography: progress on the electron column modules for SCALPEL high-throughput/alpha exposure tools
Author(s): Dirk Stenkamp; Claudia Hertfelder; O. Kienzle; Alexander Orchowski; Wigbert D. Rau; A. Weickenmeier; Warren K. Waskiewicz
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We report on the realization of the electron column modules for the SCALPEL HT/Alpha EPL systems, designed to demonstrate high wafer throughput at resolutions at and below 100 nm. We describe our highly modular setup of each electron optical component targeted at maximum flexibility and enabling a fast and smooth evolution towards higher throughput and resolution. By applying strict design and process rules we were able to set-up the complete production flow from the design, construction and manufacturing of the components of the ferrite/dielectric deflector based projection optics up to established qualification schemes within less than one year. Crucial for the overall tool performance is the timely availability of system alignment and metrology strategies. Here we adapt state-of-the-art techniques form light optical lens manufacturing to a maximum amount. We discuss our metrology and alignment approach based on aerial image analysis combined with extensive electron optical imaging simulations and present first theoretical and experimental sub-100 nm results.

Paper Details

Date Published: 26 April 2001
PDF: 10 pages
Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425222
Show Author Affiliations
Dirk Stenkamp, Carl Zeiss Lithos GmbH (Germany)
Claudia Hertfelder, Carl Zeiss Lithos GmbH (Germany)
O. Kienzle, Carl Zeiss Lithos GmbH (Germany)
Alexander Orchowski, Carl Zeiss Lithos GmbH (Germany)
Wigbert D. Rau, Carl Zeiss Lithos GmbH (Germany)
A. Weickenmeier, Carl Zeiss Lithos GmbH (Germany)
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 4404:
Lithography for Semiconductor Manufacturing II
Chris A. Mack; Tom Stevenson, Editor(s)

© SPIE. Terms of Use
Back to Top