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Proceedings Paper

Tools and processes for MEMS and nanotechnology
Author(s): Philip D. Prewett; Syed Ejazu Huq; M. C. L. Ward
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Paper Abstract

Research into MEMS and Nanotechnology covers the range of feature dimensions form sub-millimeter to nanometer scales. It relies upon tools and processes for lithography and pattern transfer drawn largely but not exclusively from the silicon semiconductor industry. Optical lithography systems, particle beam nanowriter tools and x-ray sources may be regarded as the 'machine tools' for MEMS and Nanotechnology, each with their unique advantages and limitations. They are being exploited for R and D applications ranging from customized MEMS to vacuum microelectronics and novel nanotools such as electron micro columns and multiple tip scanning probe systems.

Paper Details

Date Published: 26 April 2001
PDF: 9 pages
Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425207
Show Author Affiliations
Philip D. Prewett, Univ. of Birmingham (United Kingdom)
Syed Ejazu Huq, Rutherford Appleton Lab. (United Kingdom)
M. C. L. Ward, Univ. of Birmingham (United Kingdom)

Published in SPIE Proceedings Vol. 4404:
Lithography for Semiconductor Manufacturing II
Chris A. Mack; Tom Stevenson, Editor(s)

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