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Proceedings Paper

Continuum model of shot noise and line edge roughness
Author(s): Gregg M. Gallatin
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Paper Abstract

Decreasing feature size implies increased sensitivity to statistical fluctuations which impact critical dimension uniformity and control. In a recent work Gallatin and Liddle presented equations which describe the basic processes leading to surface and line edge roughness in a chemically amplified resists. Retaining only the lowest order terms in what is inherently a very nonlinear problem they were able to derive a scaling law and other dependencies which show reasonable agreement with experimental data. Here the analysis of the same equations is extended and expanded to include the dominant nonlinear effects.

Paper Details

Date Published: 26 April 2001
PDF: 10 pages
Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425198
Show Author Affiliations
Gregg M. Gallatin, IBM Thomas J. Watson Research Ctr. (United States)

Published in SPIE Proceedings Vol. 4404:
Lithography for Semiconductor Manufacturing II
Chris A. Mack; Tom Stevenson, Editor(s)

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