Share Email Print
cover

Proceedings Paper

Removal process for buffer layer on multilayer of EUVL mask
Author(s): Eiichi Hoshino; Taro Ogawa; Masashi Takahashi; Hiromasa Hoko; Hiromasa Yamanashi; Naoya Hirano; Akira Chiba; Byoung Taek Lee; Masaaki Ito; Shinji Okazaki
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

To obtain a stable pattern profile for the SiO2 buffer layer of an EUVL (Extreme Ultraviolet Lithography) mask, the process latitude available under actual manufacturing conditions was examined by using a conventional spin wet etcher and trying to make the etching depth as uniform as possible. Generally, wet etching uniformity depends on the sequence of the paddling and swing of the etchant nozzle. A uniformity of 1.5%, which meets manufacturing requirements, was found to be obtainable with a special nozzle. This report details a process scheme for removing the buffer layer on the multilayer of an EUVL mask, and presents a method of inspecting the buffer layer along with some simulation results on the printability of residues near the pattern edge.

Paper Details

Date Published: 9 April 2001
PDF: 5 pages
Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); doi: 10.1117/12.425097
Show Author Affiliations
Eiichi Hoshino, Association of Super-Advanced Electronics Technologies (Japan)
Taro Ogawa, Association of Super-Advanced Electronics Technologies (Japan)
Masashi Takahashi, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Hoko, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Yamanashi, Association of Super-Advanced Electronics Technologies (Japan)
Naoya Hirano, Association of Super-Advanced Electronics Technologies (Japan)
Akira Chiba, Association of Super-Advanced Electronics Technologies (Japan)
Byoung Taek Lee, Association of Super-Advanced Electronics Technologies (Japan)
Masaaki Ito, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4349:
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

© SPIE. Terms of Use
Back to Top