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Proceedings Paper

Electron-beam lithography data preparation based on multithreading MGS/PROXECCO
Author(s): Hans Eichhorn; Melchior Lemke; Juergen Gramss; B. Buerger; Uwe Baetz; Nikola Belic; Hans Eisenmann
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Paper Abstract

This paper will highlight an enhanced MGS layout data post processor and the results of its industrial application. Besides the preparation of hierarchical GDS layout data, the processing of flat data has been drastically accelerated. The application of the Proximity Correction in conjunction with the OEM version of the PROXECCO was crowned with success for data preparation of mask sets featuring 0.25 micrometers /0.18 micrometers integration levels.

Paper Details

Date Published: 9 April 2001
PDF: 6 pages
Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); doi: 10.1117/12.425088
Show Author Affiliations
Hans Eichhorn, Leica Microsystems Lithography GmbH (Germany)
Melchior Lemke, Leica Microsystems Lithography GmbH (Germany)
Juergen Gramss, Leica Microsystems Lithography GmbH (Germany)
B. Buerger, Fraunhofer-Institut fur Mikroelektronische Schaltungen und Systeme (Germany)
Uwe Baetz, Fraunhofer-Institut fur Mikroelektronische Schaltungen und Systeme (Germany)
Nikola Belic, aiss GmbH (Germany)
Hans Eisenmann, aiss GmbH (Germany)


Published in SPIE Proceedings Vol. 4349:
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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