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Proceedings Paper

High-resolution inspection of 2D microstructures using multimode polarization microscopy
Author(s): Michael Totzeck; Harald Jacobsen; Hans J. Tiziani
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Paper Abstract

For accurate measurements of structures with sharp edges, as found on photomasks and wafers, polarization methods are useful because edges provide a unique polarization-effect: depending on geometrical form and material of the edge, its effect on the incident polarization is different. We have developed three different methods for polarization- utilization: (1) polarization interferometry, (2) Jones- matrix microscopy, and (3) quantitative phase-contrast. All three procedures are incorporated into one set-up. We describe the set-up and its measurement modes.

Paper Details

Date Published: 9 April 2001
PDF: 8 pages
Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); doi: 10.1117/12.425083
Show Author Affiliations
Michael Totzeck, Univ. Stuttgart (Germany)
Harald Jacobsen, Univ. Stuttgart (Germany)
Hans J. Tiziani, Univ. Stuttgart (Germany)


Published in SPIE Proceedings Vol. 4349:
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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