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Proceedings Paper

Optical transparency of SiO2 glass in vacuum ultraviolet region and defect formation by F2 laser
Author(s): Hideo Hosono; T. Kinoshita; Yoshiaki Ikuta; K. Kajihara; Masahiro Hirano
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Paper Abstract

Vacuum ultraviolet (vuv) absorption edge and defect formation by F2 excimer laser irradiation in synthetic SiO2 glasses, which have no detectable amount of point defects, were found to be controlled by the physical disorder of the network structure. The vuv edge shifts to a long wavelength side with increasing the fraction of 3- or 4-membered ring structures that are composed of strained Si- O-Si bonds. The defect formation by F2 laser irradiation occurs via one-photon absorption processes and the primarily created defects are a pair of E' center and non-bridging oxygen hole center. The ratio of saturated defect concentrations created by the irradiation is close to that of the fraction of 3- or 4-membered ring structures in the network structure. The present results demonstrate that physical disorder primarily controls the transparency in the vuv regime and damage sensitivity to F2 laser pulse.

Paper Details

Date Published: 12 April 2001
PDF: 12 pages
Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425069
Show Author Affiliations
Hideo Hosono, Japan Science and Technology Corp. and Tokyo Institute of Technology (Japan)
T. Kinoshita, Tokyo Institute of Technology (Japan)
Yoshiaki Ikuta, Asahi Glass Co., Ltd. (Japan)
K. Kajihara, Japan Science and Technology Corp. (Japan)
Masahiro Hirano, Japan Science and Technology Corp. (Japan)


Published in SPIE Proceedings Vol. 4347:
Laser-Induced Damage in Optical Materials: 2000
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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