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Proceedings Paper

Photochemical polishing of fused-silica optics by using ArF excimer laser
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Paper Abstract

Polishing of fused silica micro optics was demonstrated without polishing dummy by using an ArF excimer laser and water solution. A fused silica glass sample was placed on the fluorocarbon grinding turntable. And the water solution was poured into a thin gap between the sample and fluorocarbon surface by capillary phenomenon. And a patterned ArF excimer laser light was irradiated on the fluorocarbon surface through the fused silica sample surface at the laser fluence of 15 mJ/cm2. By this photo irradiation, the water and fluorocarbon surface were photo- dissociated and produced hydrofluoric acid locally. By the hydrofluoric acid, the silica glass surface which were contacted with the hydrofluoric acid and fluorocarbon surface was etched. As a result, the only photo irradiated part of the silica glass sample was polished effectively.

Paper Details

Date Published: 12 April 2001
PDF: 6 pages
Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425067
Show Author Affiliations
Masataka M. Murahara, Tokai Univ. (Japan)

Published in SPIE Proceedings Vol. 4347:
Laser-Induced Damage in Optical Materials: 2000
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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