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Proceedings Paper

Influence of the standing-wave electric field pattern on the laser damage resistance of HfO2 thin films
Author(s): Marco Alvisi; M. Di Giulio; Maria Rita Perrone; Maria Lucia Protopapa; Salvatore Scaglione
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Paper Abstract

The aim of this work is to investigate the influence of the standing-wave electric field profile on the laser damage resistance of HfO2 thin films. To this end, HfO2 thin films of different optical thickness and deposited by the electron beam evaporation technique at the same deposition conditions have been analyzed. Laser damage thresholds of the samples have been measured at 308 nm (XeCl laser) by the photoacoustic beam deflection technique and microscopic inspections. The dependence of the laser damage threshold on the standing-wave electric field pattern has been analyzed.

Paper Details

Date Published: 12 April 2001
PDF: 6 pages
Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425046
Show Author Affiliations
Marco Alvisi, INFM and Univ. di Lecce (Italy)
M. Di Giulio, INFM and Univ. di Lecce (Italy)
Maria Rita Perrone, INFM and Univ. di Lecce (Italy)
Maria Lucia Protopapa, INFM and Univ. di Lecce (Italy)
Salvatore Scaglione, ENEA (Italy)


Published in SPIE Proceedings Vol. 4347:
Laser-Induced Damage in Optical Materials: 2000
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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