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Proceedings Paper

Effect of thermal annealing and second harmonic generation on bulk damage performance of rapid-growth KDP type-I doublers at 1064 nm
Author(s): Michael J. Runkel; Stephen M. Maricle; Richard A. Torres; Jerome M. Auerbach; Randy Floyd; Ruth A. Hawley-Fedder; Alan K. Burnham
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Paper Abstract

This paper discusses the results of thermal annealing and in-situ second harmonic generation (SHG) damage tests performed on six rapid growth KDP type 1 doubler crystals at 1064 nm (1(omega) ) on the Zeus automated damage test facility. Unconditioned (S/1) and conditioned (R/1) damage probability tests were performed before and after thermal annealing, then with and without SHG on six doubler crystals from the NIF-size, rapid growth KDP boule F6. The tests revealed that unannealed, last-grown material from the boule in either prismatic or pyramidal sectors exhibited the highest damage curves. After thermal annealing at 160 degree(s)C for seven days, the prismatic sector samples increased in performance ranging from 1.6 to 2.4X, while material from the pyramidal sector increased only modestly, ranging from 1.0 to 1.3X. Second harmonic generation decreased the damage fluence by an average of 20 percent for the S/1 tests and 40 percent for R/1 tests. Conversion efficiencies under test conditions were measured to be 20 to 30 percent and compared quite well to predicted behavior, as modeled by LLNL frequency conversion computer codes.

Paper Details

Date Published: 12 April 2001
PDF: 11 pages
Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425026
Show Author Affiliations
Michael J. Runkel, Lawrence Livermore National Lab. (United States)
Stephen M. Maricle, Lawrence Livermore National Lab. (United States)
Richard A. Torres, Lawrence Livermore National Lab. (United States)
Jerome M. Auerbach, Lawrence Livermore National Lab. (United States)
Randy Floyd, Lawrence Livermore National Lab. (United States)
Ruth A. Hawley-Fedder, Lawrence Livermore National Lab. (United States)
Alan K. Burnham, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4347:
Laser-Induced Damage in Optical Materials: 2000
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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