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Proceedings Paper

Fabrication of nonerasable gratings in SiO2 glasses by a two-beam holographic method using infrared femtosecond laser pulses
Author(s): Kenichi Kawamura; Nobuhiko Sarukura; Masahiro Hirano; Hideo Hosono
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Paper Abstract

Non-erasable fine pitched grating structures were successfully encoded in amorphous SiO2 glasses and amorphous SiO2 thin films on silicon wafers by colliding a pair of focused pulses split from a single femtosecond pulse from a 10 Hz mode-locked Ti:sapphire laser with a regenerative amplifier (wavelength: 800 nm; pulse duration: 100 fs; pulse energy: approximately 3 mJ/pulse). This pattern was not observed for cases in which the relative time delay of the two pulses was over 0.2 ps. The encoded periodic spacing was changed by varying the angle between the two crossed pulses. A minimum periodic spacing of approximately 430 nm was achieved for a laser wavelength of 800 nm. Structural alternations of silica network induced by intense fs-laser irradiations were observed. Laser ablation processes and volume compaction in amorphous SiO2 are origin of the formation of grating structures.

Paper Details

Date Published: 12 April 2001
PDF: 12 pages
Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425017
Show Author Affiliations
Kenichi Kawamura, Japan Science and Technology Corp. (Japan)
Nobuhiko Sarukura, Japan Science and Technology Corp. (Japan)
Masahiro Hirano, Japan Science and Technology Corp. (Japan)
Hideo Hosono, Japan Science and Technology Corp. and Tokyo Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 4347:
Laser-Induced Damage in Optical Materials: 2000
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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