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Proceedings Paper

Multilevel nanoscale DOE optimization, fabrication, and replication
Author(s): Dennis W. Prather; David Pustai; Marion R. LeCompte; Shouyuan Shi
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Paper Abstract

In this paper, we employ a wavelet-based electromagnetic optimization algorithm to enhance multilevel diffractive lens performance. As we show in this paper, the optimized performance and iteration time is very much a function of the initial lens profile. To demonstrate this we analyze various types of initial profiles ranging from scalar-based lenses to flat and random structures. Additionally, we characterize the performance of replicated multilevel lenses fabricated using a soft lithographic technique known as nanoimprint lithography ( NIL) . Experimentalresults are presented.

Paper Details

Date Published: 16 April 2001
PDF: 12 pages
Proc. SPIE 4291, Diffractive and Holographic Technologies for Integrated Photonic Systems, (16 April 2001); doi: 10.1117/12.424854
Show Author Affiliations
Dennis W. Prather, Univ. of Delaware (United States)
David Pustai, Univ. of Delaware (United States)
Marion R. LeCompte, Univ. of Delaware (United States)
Shouyuan Shi, Univ. of Delaware (United States)


Published in SPIE Proceedings Vol. 4291:
Diffractive and Holographic Technologies for Integrated Photonic Systems
Richard L. Sutherland; Dennis W. Prather; Ivan Cindrich, Editor(s)

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