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Proceedings Paper

Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials
Author(s): Andrius Marcinkevicius; Saulius Juodkazis; Vygantas Mizeikis; Shigeki Matsuo; Hiroaki Misawa
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Paper Abstract

We demonstrate a new technique for femtosecond microfabrication in transparent dielectrics, which employs non-diffracting Bessel-Gauss beams instead of commonly used Gaussian beams. The main advantage achieved this way is the ability to record linear photomodified tracks, extending along the line of non-diffracting beam propagation without sample translation, as would be required for Gaussian beams. The initial near infrared Gaussian laser beam was transformed into the non-diffracting Bessel-Gauss beam by a glass axicon (apex angle 160 deg). The beam was imaged into the bulk of the sample by a telescope consisting oftwo positive lenses, which allowed to vary the focusing cone angle from 5°to 19°, and maximum non-diffracting propagation distance up to 1 cm. We have recorded pre-programmed patterns of multi-shot damage tracks (diameter about 3 µm), extended uniformly along the z-axis by varying the damage spot coordinates in the x - y plane. The experiments were carried out in various transparent dielectrics: silica glass, sapphire, and plexyglass. Physical processes underlying the Gauss-Bessel microfabrication, and its potential applications for stereolithography, 3D microstructuring, and photonic crystal fabrication will be discussed.

Paper Details

Date Published: 12 April 2001
PDF: 9 pages
Proc. SPIE 4271, Optical Pulse and Beam Propagation III, (12 April 2001); doi: 10.1117/12.424689
Show Author Affiliations
Andrius Marcinkevicius, Univ. of Tokushima (Japan)
Saulius Juodkazis, Univ. of Tokushima (Japan)
Vygantas Mizeikis, Univ. of Tokushima (Japan)
Shigeki Matsuo, Univ. of Tokushima (Japan)
Hiroaki Misawa, Univ. of Tokushima (Japan)


Published in SPIE Proceedings Vol. 4271:
Optical Pulse and Beam Propagation III
Yehuda B. Band, Editor(s)

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