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Proceedings Paper

Properties of sputter-deposited Fe-Pd thin films
Author(s): Zheng Wang; Takashi Iijima; Gan He; Toshio Takahashi; Katsunari Oikawa; Yasubumi Furuya
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Paper Abstract

Fe-Pd thin films were deposited on SiO2/Si substrates by RF magnetron sputtering. The compositions were determined by the chemical analysis to be ranged in Pd-content about 30.0 at%. The thin films were solution-treated at 1173 K for 180s in vacuum and subsequently cooled by Ar gas flow. In the Fe- 32.62 at%Pd specimens, the as-deposited thin film possesses ultra-fine grains resulting in a long-range disorder structure. After the heat treatment, ((gamma) Fe, Pd) with an fcc structure is recrystallized and the crystallized thin film shows the texture orientation with (111) and (100) planes parallel to the film surface. In the Fe-29.97 at%Pd specimens, the as-deposited thin film exhibits a bcc structure due to less Pd content. After the heat treatment, ((gamma) Fe, Pd) fcc structure is formed at higher Pd content. Magnetic properties of the thin films are affected by the composition, crystal structure and grain size. In as-deposited thin films, two- stage I-H hysteresis loops are observed on account of the fine grains. After the heat treatment the rectangularity of the hysteresis loops is improved especially in the oriented Fe- 32.62 at%Pd thin film and Curie temperature increases with the increase of Pd-content. Magnetostriction of 3.6 X 10-5 at an applied magnetic field H equals 8.0 kA/m (equals 0.1 kOe) is observed in the solution-treated Fe-32.62 at%Pd thin film.

Paper Details

Date Published: 6 April 2001
PDF: 8 pages
Proc. SPIE 4234, Smart Materials, (6 April 2001); doi: 10.1117/12.424418
Show Author Affiliations
Zheng Wang, Tohoku National Industrial Research Institute (Japan)
Takashi Iijima, Tohoku National Industrial Research Institute (Japan)
Gan He, Tohoku National Industrial Research Institute (Japan)
Toshio Takahashi, Tohoku National Industrial Research Institute (Japan)
Katsunari Oikawa, Tohoku National Industrial Research Institute (Japan)
Yasubumi Furuya, Hirosaki Univ. (Japan)


Published in SPIE Proceedings Vol. 4234:
Smart Materials
Alan R. Wilson; Hiroshi Asanuma, Editor(s)

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