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Proceedings Paper

Atomic scale optical monitoring of the initial growth of TiO2 thin films
Author(s): A. Niilisk; A. Rosental; A. Gerst; V. Sammelselg; T. Uustare
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Paper Abstract

The initial atomic-layer-chemical-vapor-deposition growth of titanium dioxide from TiCl4 and water on quartz glass substrates is monitored in real time by incremental dielectric reflection. An interesting means for bringing the growth from the very beginning into a time-homogeneous mode is proposed and preliminarily studied. It consists in an in situ TiCl4-treatment procedure. The crystal structure and surface morphology of the prepared ultrathin films are characterized.

Paper Details

Date Published: 8 March 2001
PDF: 6 pages
Proc. SPIE 4318, Smart Optical Inorganic Structures and Devices, (8 March 2001); doi: 10.1117/12.417579
Show Author Affiliations
A. Niilisk, Univ. of Tartu (Estonia)
A. Rosental, Univ. of Tartu (Estonia)
A. Gerst, Univ. of Tartu (Estonia)
V. Sammelselg, Univ. of Tartu (Estonia)
T. Uustare, Univ. of Tartu (Estonia)


Published in SPIE Proceedings Vol. 4318:
Smart Optical Inorganic Structures and Devices
Steponas P. Asmontas; Jonas Gradauskas, Editor(s)

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