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Proceedings Paper

Effects of sputtering parameters on the optical properties of AgInSbTe phase-change film
Author(s): Jinyan Li; Lisong Hou; Hao Ruan; Quan Xie; Fuxi Gan
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Paper Abstract

AgInSbTe phase-change films were deposited on K9 glass substrates by RF magnetron sputtering technology using a Ag- In-Sb-Te alloy target. The as-deposited films were annealed at 300 degrees Celsius. The influence of background pressure, sputtering gas pressure and sputtering power on the optical properties of the phase-change films were investigated. It was found that the optical properties of the phase change films were synthetically affected by the sputtering parameters. It is disadvantageous to the optical properties of the films when the sputtering gas pressure and power are too high or too low. Lower background pressure, proper sputtering gas pressure and sputtering power are very important to producing the phase- change films with good properties.

Paper Details

Date Published: 7 February 2001
PDF: 4 pages
Proc. SPIE 4085, Fifth International Symposium on Optical Storage (ISOS 2000), (7 February 2001); doi: 10.1117/12.416824
Show Author Affiliations
Jinyan Li, Shanghai Institute of Optics and Fine Mechanics (China)
Lisong Hou, Shanghai Institute of Optics and Fine Mechanics (China)
Hao Ruan, Shanghai Institute of Optics and Fine Mechanics (China)
Quan Xie, Shanghai Institute of Optics and Fine Mechanics (China)
Fuxi Gan, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 4085:
Fifth International Symposium on Optical Storage (ISOS 2000)
Fuxi Gan; Lisong Hou, Editor(s)

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