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Proceedings Paper

Excimer laser as a total light source solution for DUV microlithography
Author(s): Palash P. Das
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Paper Abstract

Excimer lasers are now being used in the manufacturing ofultra-large scale integrated devices that require feature widths ofless than O.25?m. The excimer laser for microlithography, since its introduction in 1987 has evolved from a laboratory instrument to a manufacturing tool. We will trace the history of the excimer laser in this industry and explain why it is and remains the total solution for the present and for many years in the future.

Paper Details

Date Published: 25 January 2001
PDF: 7 pages
Proc. SPIE 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (25 January 2001); doi: 10.1117/12.414082
Show Author Affiliations
Palash P. Das, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 4184:
XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Antonio Lapucci; Marco Ciofini, Editor(s)

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