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Proceedings Paper

Fundamental aspects in the laser restoration of painted artworks
Author(s): Dmitrios Anglos; Athanasia Athannassiou; L. Antonucci; Efi Andreou; Antonia Bonarou; Savas K. Georgiou; Vivi Tornari; Vassilis Zafiropulos; Costas Fotakis
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Paper Abstract

Chemical and mechanical modifications are expected to be the two major types of side effects in the UV laser ablationbased processing of strongly absorbing molecular substrates. For the systematic characterization of these effects, studies on model polymeric systems are presented. As far as photochemical effects are concerned, UV ablation is shown to promote chemical pathways over the ones observed in the sub-ablative regime. However, the extent of these effects can be limited by an optimal etching depth vs. effective optical penetration depth in substrates of high absorptivity. Concerning mechanical effects, UV ablation is similarly shown to result in structural defects that are not observed in the irradiation at low energy fluence values. In practice, these may be limited by the inhomogeneous and stratified structure of the substrates encountered in real-life applications. The applicability of the results to the implementations of UV laser ablation is exemplified using the procedures that have been defined in laser restoration of painted artworks as a study case. Besides their implications for laser material processing implementations, the present results indicate that UV ablation introduces new physical and chemical paradigms that are of scientific importance in their own right.

Paper Details

Date Published: 25 January 2001
PDF: 6 pages
Proc. SPIE 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (25 January 2001); doi: 10.1117/12.413996
Show Author Affiliations
Dmitrios Anglos, Institute of Electronic Structure and Laser/FORTH (Greece)
Athanasia Athannassiou, Institute of Electronic Structure and Laser/FORTH (Greece)
L. Antonucci, Institute of Electronic Structure and Laser/FORTH (Greece)
Efi Andreou, Institute of Electronic Structure and Laser/FORTH (Greece)
Antonia Bonarou, Institute of Electronic Structure and Laser/FORTH (Greece)
Savas K. Georgiou, Institute of Electronic Structure and Laser/FORTH (Greece)
Vivi Tornari, Institute of Electronic Structure and Laser/FORTH (Greece)
Vassilis Zafiropulos, Institute of Electronic Structure and Laser/FORTH (Greece)
Costas Fotakis, Institute of Electronic Structure and Laser/FORTH (Greece)


Published in SPIE Proceedings Vol. 4184:
XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Antonio Lapucci; Marco Ciofini, Editor(s)

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