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Proceedings Paper

Influence of shock waves on excitation discharge for TEA gas lasers
Author(s): Go Imada; Hiroshi Yamanoi; Masataro Suzuki; Wataru Masuda; Kiyoshi Yatsui
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Paper Abstract

The influence of shock waves on the excitation discharge for TEA gas laser have been investigated eliminating the other factors which may affect the discharge instabilities, such as gas density depletion, discharge products, residual ions and electrode heating. A shock wave of 1.2 in Mach number is produced by a shock tube with gas mixture of helium and argon in order to simulate the ArF excimer laser. The schlieren photographs of shock wave and direct images of light emifted from the discharge are recorded simultaneously by a high-speed image-converter camera. It is found that, if the shock wave does not reach to the discharge region, glow discharge occurs only in front of the shock wave. Even if the shock wave passes through the middle of discharge region, the glow discharge occurs only in front of the shock wave. However, an arc-like filament through the shock front is also produced. If the shock wave passes through the discharge region, the weak glow discharge can be produced again, however, a surface discharge is also produced between the main electrode and the pre-ionization electrode. It becomes clear that the discharge instabilities depend on the location of shock wave in the discharge region.

Paper Details

Date Published: 25 January 2001
PDF: 4 pages
Proc. SPIE 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (25 January 2001); doi: 10.1117/12.413966
Show Author Affiliations
Go Imada, Nagaoka Univ. of Technology (Japan)
Hiroshi Yamanoi, Nagaoka Univ. of Technology (Japan)
Masataro Suzuki, Nagaoka Univ. of Technology (Japan)
Wataru Masuda, Nagaoka Univ. of Technology (Japan)
Kiyoshi Yatsui, Nagaoka Univ. of Technology (Japan)


Published in SPIE Proceedings Vol. 4184:
XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Antonio Lapucci; Marco Ciofini, Editor(s)

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