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Proceedings Paper

Zone plate for x-ray applications
Author(s): Enzo M. Di Fabrizio; Alessandro Nottola; Stefano Cabrini; Filippo Romanato; Lisa Vaccari; Anna Massimi
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Paper Abstract

High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution regime zone plate with 40 nm outermost zone and thickness of 0.2 micrometer are shown. For high efficiency performances, multilevel zone plate and continuous profile were fabricated to provide an increase of efficiency at the first diffraction order and to suppress higher ones. The combination of the two lithography allows a powerful design flexibility at several energy regimes.

Paper Details

Date Published: 5 January 2001
PDF: 8 pages
Proc. SPIE 4145, Advances in X-Ray Optics, (5 January 2001); doi: 10.1117/12.411653
Show Author Affiliations
Enzo M. Di Fabrizio, Lab. TASC/Instituto Nazionale della Materia (Italy)
Alessandro Nottola, Istituto di Elettronica dello Stato Solido (Italy)
Stefano Cabrini, Istituto di Elettronica dello Stato Solido (Italy)
Filippo Romanato, IMEC (Belgium)
Lisa Vaccari, Lab. TASC/Instituto Nazionale deall Materia (Italy)
Anna Massimi, IMEC (Belgium)


Published in SPIE Proceedings Vol. 4145:
Advances in X-Ray Optics
Alan G. Michette; Andreas K. Freund; Tetsuya Ishikawa; Sebastian Oestreich; Derrick C. Mancini; Ali M. Khounsary; Derrick C. Mancini; Alan G. Michette; Sebastian Oestreich, Editor(s)

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