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Proceedings Paper

Controlling thin film thickness distribution in two dimensions
Author(s): David M. Broadway; Michael D. Kriese; Yuriy Ya. Platonov
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Paper Abstract

We present the results of theoretical calculations pertaining to the control of the film thickness distribution in two dimensions. The calculations are relevant to magnetron sputter deposition in which two different deposition geometries are considered. One of which is for an 'in-line' system where the substrate passes along a linear path in front of each target, and the other for cylindrical deposition geometry where the substrates are mounted on a rotating drum. Results of various thickness gradients on flat as well as spherical and cylindrical substrates are shown. The thickness distribution in one dimension is controlled by the use of a contoured shield which appropriately intercepts sputtered material between the target and substrate. The film thickness in the other dimension is controlled by changing the velocity of the substrate through the deposition region. The shield contour and velocity profile required to achieve these gradients are also given.

Paper Details

Date Published: 5 January 2001
PDF: 8 pages
Proc. SPIE 4145, Advances in X-Ray Optics, (5 January 2001); doi: 10.1117/12.411623
Show Author Affiliations
David M. Broadway, Osmic, Inc. (United States)
Michael D. Kriese, Osmic, Inc. (United States)
Yuriy Ya. Platonov, Osmic, Inc. (United States)

Published in SPIE Proceedings Vol. 4145:
Advances in X-Ray Optics
Alan G. Michette; Andreas K. Freund; Tetsuya Ishikawa; Sebastian Oestreich; Derrick C. Mancini; Ali M. Khounsary; Derrick C. Mancini; Alan G. Michette; Sebastian Oestreich, Editor(s)

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