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Proceedings Paper

Hard x-ray multilayers: a study of different material systems
Author(s): Adrian Ivan; Ricardo J. Bruni; Kyung Wha Byun; Paul Gorenstein; Suzanne E. Romaine
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Paper Abstract

Multilayer structures with depth-graded spacing can show a high reflectivity in a broad energy passband for hard X-rays if the interface roughness/diffuseness is controlled and minimized. We present a study of several multilayer systems deposited by DC magnetron sputtering on <111> silicon wafers and superpolished fused silica substrates. The material combinations discussed are W/Si, WSi2/Si, W/C, Pt/C, Ni/C, Ni/B4C, and Mo/Si. The deposition method used was DC magnetron sputtering at low argon pressures (1.5 to 5 mT). The characterization methods used were: Atomic Force Microscopy in tapping mode, stylus profilometry, Rutherford backscattering, cross sectional TEM, and specular X-ray reflectivity (XRR) scans at 8.05 keV. Different process parameters were varied in order to optimize the interface roughness/diffuseness (sigma) that was measured by XRR scans.

Paper Details

Date Published: 5 January 2001
PDF: 8 pages
Proc. SPIE 4145, Advances in X-Ray Optics, (5 January 2001); doi: 10.1117/12.411622
Show Author Affiliations
Adrian Ivan, Harvard-Smithsonian Ctr. for Astrophysics and Massachusetts Institute of Technology (United States)
Ricardo J. Bruni, Harvard-Smithsonian Ctr. for Astrophysics (United States)
Kyung Wha Byun, Harvard-Smithsonian Ctr. for Astrophysics and Harvard Univ. (United States)
Paul Gorenstein, Harvard-Smithsonian Ctr. for Astrophysics (United States)
Suzanne E. Romaine, Harvard-Smithsonian Ctr. for Astrophysics (United States)


Published in SPIE Proceedings Vol. 4145:
Advances in X-Ray Optics
Alan G. Michette; Sebastian Oestreich; Derrick C. Mancini; Andreas K. Freund; Tetsuya Ishikawa; Ali M. Khounsary; Derrick C. Mancini; Alan G. Michette; Sebastian Oestreich, Editor(s)

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