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Proceedings Paper

Establishment of production process and assurance method for alternating phase-shift masks
Author(s): Shiaki M. Murai; Yasuhiro Koizumi; Tatsuhiko Kamibayashi; Hidetaka Saitou; Morihisa Hoga; Yasutaka Morikawa; Hiroyuki Miyashita
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Paper Abstract

Alternating phase shift masks (altPSMs) are effective in reducing MEF. However, altPSMs have been used in device development, not in production, because phase-defect assurance has not been sufficient. An assurance method for 180- and 150-nm rule altPSMs was established by the use of both MD-2000 and KLA/STARlight. We have started production of defect-free altPSMs with quartz etched shifters and single trench structures by a two-step quartz etching process, which has an advantage of low phase-defect density.

Paper Details

Date Published: 22 January 2001
PDF: 12 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410772
Show Author Affiliations
Shiaki M. Murai, Dai Nippon Printing Co., Ltd. (Japan)
Yasuhiro Koizumi, Dai Nippon Printing Co., Ltd. (Japan)
Tatsuhiko Kamibayashi, Dai Nippon Printing Co., Ltd. (Japan)
Hidetaka Saitou, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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