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Proceedings Paper

Development of simplified process for KrF excimer halftone mask with chrome-shielding method: II
Author(s): Shinji Kobayashi; Kunio Watanabe; Kiyochige Ohmori
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Paper Abstract

A new simplified process is developed successfully for KrF excimer half-tone mask with chrome shielding method. It is useful for shortening process time of half-tone mask with two layers of chrome and half-tone film. We reported a simplified process in BACUS99. The old simplified process had problems in the stability of ashing rate and the resolution of chrome etching. The instability of ashing rate causes mask defects. And the enhancement of resolution is required for small hole patterns in the case of 4X scanner compared with 5X stepper. In the new simplified process, the stability of ashing rate is achieved by the change of etching sequence, and the resolution is enhanced by optimizing chrome etching conditions. It is confirmed in this paper that the half-tone masks fabricated by the new simplified process have mask quality and optical capability which are required in fabrication of devices for 0.15um generation.

Paper Details

Date Published: 22 January 2001
PDF: 9 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410761
Show Author Affiliations
Shinji Kobayashi, Sharp Corp. (Japan)
Kunio Watanabe, Sharp Corp. (Japan)
Kiyochige Ohmori, Sharp Corp. (Japan)


Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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