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Proceedings Paper

Improvement of the efficiency of OPC data handling
Author(s): Nobuhito Toyama; Takayuki Ikemoto; Kouji Ishida; Hiroyuki Miyashita
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Paper Abstract

OPC has been acknowledged essential technique to achieve low k1 lithography applying any optical process or even if phase-shift controlling. Since several years ago some aspect of OPC technique has been realized with OPC oriented tools, applied to actual design, and many success stories are reported. However according to semiconductor design scale itself is growing as millions of transistors a year as the rule decreasing, so called aggressive OPC is forcing not only data handling distress but also reticle fabrication difficulty even though the hardware's progressing. In this paper, we introduce the evaluation of the performance and the effect from weak to aggressive OPC that has been proposed. Then we will discuss the improved OPC applying modeling and criteria based on the trade off between OPC data handling efficiency and the effect.

Paper Details

Date Published: 22 January 2001
PDF: 8 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410742
Show Author Affiliations
Nobuhito Toyama, Dai Nippon Printing Co., Ltd. (Japan)
Takayuki Ikemoto, Dai Nippon Printing Co., Ltd. (Japan)
Kouji Ishida, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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