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Proceedings Paper

Laser resist screening for iP3500/3600 replacement for advanced reticle fabrication
Author(s): Fumiko Ota; Hideo Kobayashi; Takao Higuchi; Keishi Asakawa
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Paper Abstract

This paper will describe resist screening results for iP3500/3600 replacement for the advanced laser reticle fabrication, resist coating thickness optimization proposal for the next generation as well. THMR-M100 (TOK) showed the best pattern profile with sharp shoulders and almost with no footing, and a newly developed resist, a joint-work between HOYA and a resist maker, showed the best performance in adhesion to chrome. However, there was not the best selection found unfortunately by this screening, which exceeded iP3500 in linearity and iso-dense bias (IDB) that was indispensable one for the advanced laser reticle fabrication. As regards coating thickness, we selected 307.5 nm thick as a candidate for coating thickness standard for the future with considering resist resolution performance such as linearity, y p(0-80) value and undercut, in conjunction with a risk of clear pinhole defects. For more precise comparison of iso-dense bias (IDB) performance, it would be better that the examination method is standardized because of the design pattern dependence of IDB.

Paper Details

Date Published: 22 January 2001
PDF: 8 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410737
Show Author Affiliations
Fumiko Ota, HOYA Corp. (Japan)
Hideo Kobayashi, HOYA Corp. (Japan)
Takao Higuchi, HOYA Corp. (Japan)
Keishi Asakawa, HOYA Corp. (Japan)

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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