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Proceedings Paper

Eddy current evaluation for a high-resolution EB system
Author(s): Naoharu Shimomura; Munehiro Ogasawara; Kiyoshi Hattori; Jun Takamatsu; Hitoshi Sunaoshi; Shusuke Yoshitake; Yuuji Fukudome; Kiminobu Akeno
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Paper Abstract

A semi-in-lens electron beam (EB) optical system improves the beam resolution. However, the eddy current is induced in the target and deviates the beam position when the stage is moving continuously. We calculated the eddy current distribution by approximating the magnetic field on the target to a Gaussian distribution. In the mask-scan EB column1 the maximum value and the dispersion of the magnetic field on the target are 0.01 T and 30 mm, respectively. The beam shift due to the eddy current flowing in the Cr film on a reticle is 1.5 X 10-11 m at the stage speed of 0.1 m/s. Therefore, the eddy current does not degrade the positional accuracy.

Paper Details

Date Published: 22 January 2001
PDF: 8 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410723
Show Author Affiliations
Naoharu Shimomura, Toshiba Corp. (Japan)
Munehiro Ogasawara, Toshiba Corp. (Japan)
Kiyoshi Hattori, Toshiba Corp. (Japan)
Jun Takamatsu, Toshiba Corp. (Japan)
Hitoshi Sunaoshi, Toshiba Corp. (Japan)
Shusuke Yoshitake, Toshiba Corp. (Japan)
Yuuji Fukudome, Toshiba Corp. (Japan)
Kiminobu Akeno, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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