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Proceedings Paper

New architecture for laser pattern generators for 130 nm and beyond
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Paper Abstract

A new breed of pattern generators for photomasks using a new DUV spatial light modulator (SLM) technology is under development in a collaborative effort between Micronic Laser Systems AB, Taby, Sweden and the Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS), Dresden, Germany. Current pattern generator architectures using a limited number of scanning beams will not be able to support future production requirements with ever-increasing data complexity and resolution. The new SLM technology provides a means for high resolution and massive parallel exposure to alleviate these difficulties. There are many architectural similarities to that of a modern stepper and the technology can provide the resolution to rival that of e-beam pattern generators, yet with the productivity of laser patterning. In this paper we describe the architecture of an SLM exposure system, the SLM technology, and will consider key aspects for the intended application.

Paper Details

Date Published: 22 January 2001
PDF: 6 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410691
Show Author Affiliations
Ulric B. Ljungblad, Micronic Laser Systems AB (Sweden)
Torbjoern Sandstrom, Micronic Laser Systems AB (Sweden)
Hans Buhre, Micronic Laser Systems AB (Sweden)
Peter Duerr, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Hubert K. Lakner, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)


Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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